The Thin film photovoltaic, solar sputtering targets thermal and concentrated solar power systems offer great alternatives for the energy requirements of the future. To improve the efficiency of solar systems, it is essential that high-grade materials are sourced. DX Advanced Materials Co offers various high purity sputtering targets.
Solar Sputtering Targets Thermal Applications:
CIG(S), Silicon or Cadmium Telluride CdTe based technology.
Thin Film photovoltaics sputtering targets :
CCDs (charge-coupled display devices), CRTs (cathode ray tubes), Flat Panels, Electroluminesent, Photoluminescent, Liquid Crystal Displays (LCD), Plasma Displays, Thin Film Transistor (TFT)
Typical Solar Sputtering Targets Materials:
Cadmium Telluride CdTe, Cadmium Selenide CdSe, Cadmium Sulphide CdS, Indium-Tin Oxide In2O3-SnO2, Silicon dioxide SiO2, Zirconium boride ZrB2, various metals and their alloys
Concentrated solar power systems,Efficient signage and outdoor display systems, Gas turbine blade coatings, Turbine bearings, Solar panels.
High purity silicon crystals are used to manufacture solar cells. The crystals are processed into solar cells using the melt and cast method. The cube-shaped casting is then cut into ingots, and then sliced into very thin wafers.
Silicon atoms have four “arms.” Under stable conditions, they become perfect insulators. By combining a small number of five-armed atoms (with a surplus electron), a negative charge will occur when sunlight (photons) hits the surplus electron. The electron is then discharged from the arm to move around freely. Silicon with these characteristics conducts electricity. This is called an n-type (negative) semiconductor, and is usually caused by having the silicon ‘doped’ with a phosphorous film.
In contrast, combining three-armed atoms that lack one electron results in a hole with an electron missing. The semiconductor will then carry a positive charge. This is called a p-type (positive) semiconductor, and is usually obtained when boron is doped into the silicon.