Carbon Sputtering Targets | C Targets|Graphite Sputtering Targets

Carbon Sputtering Targets | C Targets|Graphite Sputtering Targets Manufacturers


DXAM can customize Carbon Sputtering Targets | C Targets|Graphite Sputtering Targets with high quality and low price according to requested shapes,size,purity and purity,etc.


Description

Carbon Sputtering Targets Manufacturers | C Targets|Graphite Sputtering Targets In China

Carbon (from Latin: carbo “coal”) is a chemical element with symbol C and atomic number 6. It is nonmetallic and tetravalent—making four electrons available to form covalent chemical bonds. Three isotopes occur naturally, 12C and 13C being stable, while 14C is a radioactive isotope, decaying with a half-life of about 5,730 years. The atoms of carbon can bond together in different ways, termed allotropes of carbon. The best known are graphite, diamond, and amorphous carbon. The physical properties of carbon vary widely with the allotropic form.

Carbon(C) Element
Basic Information

Name: Carbon
Symbol: C
Atomic Number: 6
Atomic Mass: 12.0107 amu
Melting Point: 3500.0 °C (3773.15 °K, 6332.0 °F)
Boiling Point: 4827.0 °C (5100.15 °K, 8720.6 °F)

Number of Protons/Electrons: 6
Number of Neutrons: 6
Classification: Non-metal
Crystal Structure: Hexagonal
Density @ 293 K: 2.62 g/cm3
Color: May be black

Product List
Metals
NameSignPurityCharacter

Carbon

C

99.99%

Rod, Sheet, Plate, Crucible, Pellet, Sputtering Target

Pyrolytic Graphite (PG)

PG

99.998%

Rod, Sheet, Plate, Crucible, Pellet, Sputtering Target

Alloys
NameSignPurityCharacter

Aluminum Titanium Carbon Alloy

AlTiC Alloy

5% Ti – 0.2% C

Waffles, Rods

Aluminum Titanium Carbon Alloy

AlTiC Alloy

3% Ti – 0.2% C

Waffles, Rods

Aluminum Titanium Carbon Alloy

AlTiC Alloy

3% Ti – 0.15% C

Waffles, Rods

Compounds
NameSignPurityCharacter

Boron carbide

B4C

99.5

Sputtering Target, Evaporation material,  Powders(40-300mesh)

Chromium Carbide

Cr3C2

99.5%

Sputtering Target, Evaporation material,  Powders(40-300mesh)

Chromium Carbonitride

CrCN

99.5%

Sputtering Target, Evaporation material,  powders(40-300mesh)

Hafnium carbide

HfC

99.5%

Sputtering Target, Evaporation material,  powders(40-300mesh)

Molybdenum carbide

Mo2C

99.5

Sputtering Target, Evaporation material,  powders(40-300mesh)

Niobium Carbide

NbC

99.5%

Sputtering Target, Evaporation material,  powders(40-300mesh)

Silicon carbide

SiC

99.5

Sputtering Target, Evaporation material,  powders(200-300mesh)

Tantalum Carbide

TaC

99.5%

Sputtering Target, Evaporation material,  powders(200-300mesh)

Titanium Carbide

TiC

99.5%

Sputtering Target, Evaporation material,  powders(40-300mesh)

Titanium Carbonitride

TiCN

99.5%

Sputtering Target, Evaporation material,  powders(40-300mesh)

Tungsten carbide

WC

99.5%

Sputtering Target, Evaporation material,  powders(200-300mesh)

Tungsten carbide

W2C

99.5%

Sputtering Target, Evaporation material,  powders(200-300mesh)

Tungsten carbide -cobalt

WC – 6 wt. % Co

99.5%

Sputtering Target, Evaporation material,  powders(200-300mesh)

Tungsten carbide -cobalt

W2C – 12 wt. % Co

99.5%

Sputtering Target, Evaporation material,  powders(200-300mesh)

Vanadium carbide

VC

99.5

Sputtering Target, Evaporation material,  powders(200-300mesh)

Zirconium Carbide

ZrC

99.5%

Sputtering Target, Evaporation material,  powders(100-300mesh)