Planar Sputtering Targets

Planar sputtering targets


DXAM manufactures high quality planar sputtering target.  Our product is consistently good in quality and purity,We also makes doped targets by customer requirement about size,depth and purity,etc.


Description

Planar Sputtering Targets

DXAM planar sputter target portfolio includes a wide range of planar targets for large area deposition and other market applications:

Cast: Our portfolio includes Ag, In alloys, Li, Si, Zn alloys and other materials. Targets can be cast directly to a backing plate or bonded. Soleras also offers material-specific re-casting solutions.

HIP/Hot-pressed/Sintered: Soleras offers a range of targets made using powder-metallurgical and ceramic processing methods. These include, but are not limited to, Al2O3, AZO, Cr, ITO, Nb, SiO2, Ti and W and its alloys.

Rolled/Forged/Brazed: Soleras offers custom engineering and unique thermo-mechanical process solutions (e.g., grain-size control) for various materials, including Ag, Nb, NiCr, Ta and Zr.

Bonded: Soleras offers a broad portfolio of bonded targets in the planar form factor for large area deposition and other applications, providing targeted bonding solutions (e.g., custom solders and metallurgical bonding/brazing).

DXAM offers a full spectrum of planar sputtering targets. The most popular are listed below.

Metals

SilverAg
AluminumAl
GoldAu
CobaltCo
ChromiumCr
CopperCu
GermaniumGe
HafniumHf
IndiumIn
MagnesiumMg
MolybdenumMo
NiobiumNb
NickelNi
PlatinumPt
SiliconSi
TinSn
TantalumTa
TitaniumTi
VanadiumV
TungstenW
YttriumY
ZincZn
ZirconiumZr

Compounds

Aluminum OxideAl2O3
Aluminum-doped Zinc OxideAZO
Indium Zinc OxideIZO
Indium-TinInSn
Indium Tin OxideITO
NiobiumSuboxideNbOx
Silicon-AluminumSiAl
Silicon OxideSiO2
Titanium OxideTiOx
Zinc-AluminumZnAl