DX Advanced Materials Co is a worldwide manufacturer and supplier of glass sputtering targets for the glass coating industry that including coating materials for architectural glass, automotive glass, photovoltaics, mirrors and other coatings.
Coated glass is glass with one or more layers of metal, metal alloy or a metal compound thin film coating, to alter the optical properties of the glass to meet certain requirements.
Coated glass can be divided into the following categories: heat-reflective glass, low-emissivity glass (Low-E), conductive film glass according to it’s different characteristics, widely applying to architecture, energy-saving projects and electronics.
So far, industrial production of coated glass are mainly adopt magnetron sputtering process for mass production, the thin film coating obtained by this technology have many superior advantages, such as better combination with substrate and very high purity and density. Benefiting from good repeatability of sputtering process, uniform thin film can be obtained on large area of substrate.
Automotive Glass materials are highly transparent and electrically conductive for flat or bent glass, solar control, mirrors and defrosting layers.
While decorating thin film is used for Increase coated product’s color brightness, hardness and wear resistance, to prolong product life.
DXAM Advanced Materials Co is specialized in producing superior metal and metal alloy sputtering targets and evaporation materials for glass coating and decorating, with very competitive price and flexible size.
|Materials List Applied To Glass Coatings|
|Chromium Sputtering Target / Arc cathodes||Cr||2N5, 3N, 3N5||Planar targets, rotary targets, acr cathode|
|Titanium Aluminum Sputtering Target||Ti + Al||2N5, 3N||Planar sputtering targets, arc cathodes|
|Silver sputtering target||Ag||4N, 4N5, 5N||Planar sputtering target, Rotary sputtering target|
|Silicon Sputtering Target||Si||4N, 5N, 6N||Planar, Rotary|
|Nickel Chromium Sputtering Target||Ni + Cr||3N, 3N6, 4N||Planar target, Rotary target|
|Nickel Sputtering Target||Ni||3N, 3N6, 4N, 4N5, 5N||Planar target, Rotary target|
|Nickel Vanadium Sputtering Target||Ni + V||3N, 3N6, 4N||Planar target, Rotary target|
|Titanium Sputtering Target||Ti||3N, 4N, 4N5, 5N||Planar target, Rotary target|
|Vanadium Sputtering Target||V||2N5, 3N||Planar target, Rotary target|
|Molybdenum Sputtering Targets||Mo||3N5||Planar target, Rotary target|
DXAM large area glass sputtering targets are precision manufactured, the processes include:
✦ Vacuum Arc Remelting
✦ Powder Metallurgy
✦ Hot Isostatic Press (HIP)
✦ Hot plasma spraying (HPS)
✦ Cold plasma spraying (CPS)
DXAM large area glass sputtering targets applications include:
✦ Aluminum – Al, 99.9%, 99.95%, 99.99%, 99.995%, 99.999%; rotatable target, planar target.
✦ Chromium – Cr , 99.5%, 99.8%, 99.9%, 99.95%; rotatable target, planar target.
✦ Niobium – Nb, 99.95%; rotatable target, planar target.
✦ Niobium Oxide – NbOx, 99.95%, 99.99%; rotatable target, planar target.
✦ Nickel Chromium – NiCr, 99.9%, 99.95%, 99.99%; 80:20, 60:40, 50:50, 40:60, wt%; rotatable target, planar target.
✦ Silicon – Si, 99.9%, 99.95%, 99.99%, 99.995%, 99.999%; rotatable target, planar target.
✦ Titanium – Ti, CP Grade 2 (99.2%), CP Grade 1 (99.7%), 99.9%, 99.95%, 99.99%, 99.995%, 99.999%; rotatable target, planar target.
✦ Titanium Oxide – TiOx, 99.6%; rotatable target, planar target.
✦ Tin Zinc – ZnSn, 99.99%; 50:50, wt%; rotatable target.