Now, flat-panel displays have almost completely replaced old CRT displays, specifically widely use in small portable devices such as laptops, mobile phones, smartphones, digital cameras, camcorders, point-and-shoot cameras, and pocket video cameras, they have been already a part of our lives every day.
Plane array and digitalization is the megatrend for all display systems nowadays. The LCD (Liquid crystal display) is the fastest developing item. It adopts thin film transistors since its crystal display shares the benefits of low power consumption, high illuminating level and fast response. It has therefore become the essential display production industry all over the world. To produce either the array substrate or the color filter film for manufacturing the LCD will inevitably rely on sputtering films with high-uniformity and flatness. DXAM produce various metal and metal alloy sputtering target applied in flat panel display field, with high purity and flexible dimension, such as high purity(5N) Aluminum sputtering target for depositing electrode layer in TFT(thin film transistor), chromium sputtering target for black matrix thin film materials, and molybdenum sputtering target for protective thin film materials. The sputtering target we produced for flat panel display are listed below.
As a top leading manufacturer for thin film coating materials, DX Advance Metal develops and provides sputtering targets and arc cathodes cover larger planar and rotatable targets for Flat Panel Display applications include:
✦ LCD (Liquid Crystal Display)
✦ STN (Super Twisted Nematic)
✦ TFT (Thin film Transistor)
✦ PDP (Plasma Display Panel)
✦ OLED (Organic Light Emitting Display)
✦ FED (Field Emitting Display)
✦ Vacuum Arc Remelting
✦ Powder Metallurgy
✦ Hot Isostatic Press (HIP)
✦ Hot plasma spraying (HPS)
✦ Cold plasma spraying (CPS)
✦ Aluminum – Al, 99.9%, 99.95%, 99.99%, 99.995%, 99.999%; rotatable target, planar target.
✦ AZO – Aluminum doped Zinc Oxide, 99.95%; 98:2, wt%; rotatable target.
✦ Molybdenum – Mo, 99.95%; rotatable target, planar target.
✦ Niobium – Nb, 99.95%; rotatable target, planar target.
✦ Niobium Oxide – NbOx, 99.95%, 99.99%; rotatable target, planar target.
✦ Silicon – Si, 99.9%, 99.95%, 99.99%, 99.995%, 99.999%; rotatable target, planar target.
✦ Silicon Aluminum – SiAl, 99.9%; 90:10, wt%; rotatable target.
✦ Titanium Oxide – TiOx, 99.6%; rotatable target, planar target.